About us - Prof. Aleksander Wrobel

Aleksander M. WROBEL, Prof. dr., Professor, Head of research group

Affiliation:

Department of Engineering of Polymer Materials
Tel.: +(48-42)-680-3-203, fax: +(48-42)- 684 71 26
e-mail: amwrobel@bilbo.cbmm.lodz.pl

Scientific career:

1969 PhD degree in technical science, Technical University of Lodz

1972 Postdoctoral stay at the University of Liverpool in the group of Prof. C. H. Bamford
Centre of Molecular and Macromolecular Studies, Department of Polymer Physics headed by Prof. M. Kryszewski
1977-1978 Fellow at Ecole Polytechnique of Montreal
1985 Habilitation in chemistry (formation of thin films by low-temperature plasma polymerization of organosilicon compounds), Technical University of Lodz. Then he developed the remote plasma chemical vapor deposition process for the formation of high quality silicon-based thin films
1986-1987 Visiting professor at Ecole Polytechnique of Montreal
1989, 1990 Invited fellow at Tubingen University
1992-1993
and 1996 		Visiting professor at Shizuoka University
2001 Title of Professor in chemistry
2002 Professor position at Centre of Molecular and Macromolecular Studies

Member of editorial boards:

Plasmas and Polymers (Kluwer/Plenum),
Journal of Wide Bandgap Materials (Technomic)

Awards:

1979 and 1983 Team-awards of the Secretary of Polish Academy of Sciences

Current research area:

  • Formation of amorphous silicon-based superhard and high wear resistance thin-film materials, such as: silicon carbide a-Si:C:H and silicon carbonitride a-Si:N:C:H by the remote plasma chemical vapor deposition from organosilicon single-source precursors.
  • Kinetics and chemistry of film formation process.
  • Morphological and chemical structure of the deposited films.
  • Mechanical and optical properties of the films.
  • Film structure - property relationships.

Selected references:

  1. A. M. Wrobel, M. R. Wertheimer
    Plasma-polymerized organosilicons and organometallics,
    in: Plasma Deposition, Treatment, and Etching of Polymers,
    R. d'Agostino, ed., Academic Press, Boston 1990, Chapter 3, pp 163-268

  2. A. M. Wrobel, S. Wickramanayaka, Y. Nakanishi, Y. Fukuda, Y. Hatanaka
    Remote hydrogen plasma chemical vapor deposition of amorphous hydrogenated silicon-carbon films from an organosilane molecular cluster as a novel single-source precursor:
    Structure, growth mechanism, and properties of the deposit
    Chem. Mater., 7, 1403-1413 (1995)

  3. A. M. Wrobel, W. Stanczyk
    Mechanism of the activation of 1,1,3,3-tetramethyl-1,3-disilacyclobutane in plasma chemical vapor deposition Chem. Mater., 6, 1766-1770 (1994)

  4. M. Wrobel, S. Wickramanayaka, Y. Nakanishi, Y. Hatanaka, S. Pawłowski, W. Olejniczak
    Atomic hydrogen-induced chemical vapor deposition of a-Si:C:H thin-film materials from alkylsialne precursors
    Diamond Relat. Mater., 6, 1081-1091 (1997)

  5. A. M. Wrobel, A. Walkiewicz-Pietrzykowska
    Mechanism of the initiation step in atomic hydrogen-induced CVD of amorphous hydrogenated silicon-carbon films from single-source precursors
    Adv. Mater. CVD, 4, 133-141 (1998)

  6. M. Wrobel, A. Walkiewicz-Pietrzykowska, S. Wickramanayaka, Y. Hatanaka
    Mechanism of amorphous silica film formation from tetraethoxysilane in atomic oxygen-induced chemical vapor deposition
    J. Electrochem. Soc., 145, 2866-2876 (1998)

  7. A. M. Wrobel, S. Wickramanayaka, K. Kitamura, Y. Nakanishi, Y. Hatanaka
    Structure-property relationships for amorphous hydrogenated silicon-carbon films produced by atomic hydrogen-induced CVD from single-source precursor
    Adv. Mater. CVD, 6, 315-322 (2000)

  8. M. Wrobel, A. Walkiewicz-Pietrzykowska, M. Stasiak; J. E. Klemberg Sapieha, D. M. Bielinski
    Remote microwave plasma chemical vapor deposition of thin Si:N:C films from single source precursor
    J. Wide Bandgap Mater., 8, 3-15 (2000)

  9. M. Wrobel, A. Walkiewicz-Pietrzykowska, Y. Hatanaka, S. Wickramanayaka, Y. Nakanishi
    Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon-Carbon and Silica Films from Organosilicon Sources
    Chem. Mater., 13, 1884-1895 (2001)

  10. A. M. Wrobel
    Remote hydrogen plasma chemical vapor deposition from alkylsilane and alkylcarbosilane single-sources:
    Mechanism of the process and properties of resulting silicon-carbon deposits
    J. Phys. IV France, 11, Pr 3 691-702 (2001)