Scientific career:
| 1969 | PhD degree in technical science, Technical University of Lodz |
| 1972 | Postdoctoral stay at the University of Liverpool in the group of Prof. C. H. Bamford |
| 1972 | Centre of Molecular and Macromolecular Studies, Department of Polymer Physics headed by Prof. M. Kryszewski |
| 1977-1978 | Fellow at Ecole Polytechnique of Montreal |
| 1985 | Habilitation in chemistry (formation of thin films by low-temperature plasma polymerization of organosilicon compounds), Technical University of Lodz. Then he developed the remote plasma chemical vapor deposition process for the formation of high quality silicon-based thin films |
| 1986-1987 | Visiting professor at Ecole Polytechnique of Montreal |
| 1989, 1990 | Visiting professor at Tubingen University |
| 2001 | Title of Professor in chemistry |
| 2002 | Professor position at Centre of Molecular and Macromolecular Studies |
| 2009- | Professor emeritus |
Member of editorial boards
| 1992-1998 | Journal of Chemical Vapor Deposition (Technomic Publishing) |
| 1998-2004 | Plasmas and Polymers (Kluwer Academic-Plenum Publishers) |
| 1999-2002 | Journal of Wide Bandgap Materials (Sage Publications) |
| 2004-2006 | Plasma Processes and Polymers (Wiley-VCH) |
| 2009-2012 | International Journal of Biomedical Engineering and Consumer Health Informatics (Ser. Publications) |
| 2004-2015 | Chemical Vapor Deposition (Wiley-VCH) |
| 2015-2020 | Advanced Materials Interfaces (Wiley-VCH) |
| 2009- | Applied Organometallic Chemistry (Wiley) |
Research area:
Formation of amorphous silicon-based superhard and high wear resistance thin-film materials, such as: silicon carbide, a-SiC:H, and silicon carbonitride, a-SiNC:H, by the remote plasma chemical vapor deposition technique from organosilicon single-source precursors. Kinetics and chemistry of film formation process. Morphological and chemical structure of the deposited films. Mechanical and optical properties of the films. Film structure – property relationships.
Selected recent articles
M. Wrobel*, P. Uznanski, A. Walkiewicz-Pietrzykowska, B. Glebocki, .E. Bryszewska, Silicon Oxycarbide Thin Films by Remote Microwave Hydrogen Plasma CVD Using a Tetramethyldisiloxane Precursor, Chem. Vap. Deposition 2015, 21, 88–93.
M. Wrobel*, P. Uznanski, and A. Walkiewicz-Pietrzykowska, Silicon Oxycarbide Films Produced by Remote Microwave Hydrogen Plasma CVD using a Tetramethyldisiloxane Precursor: Growth Kinetics, Structure, Surface Morphology, and Properties, Chem. Vap. Deposition 2015, 21, 307–318.
Walkiewicz-Pietrzykowska, P. Uznanski*, A. M. Wrobel, Silicon Carbide, Silicon Carbonitride, and Silicon Oxycarbide Thin Films Formed by Remote Hydrogen Microwave Plasma CVD, Current Organic Chemistry, 2017, 21, 1-11.
A.M. Wrobel,* P. Uznanski, A. Walkiewicz‐Pietrzykowska, K. Jankowski, Amorphous silicon carbonitride thin‐film coatings produced by remote nitrogen microwave plasma chemical vapour deposition using organosilicon precursor, Appl. Organometal. Chem. 2017, 31, e3871.
Uznanski, B. Glebocki , A. Walkiewicz-Pietrzykowskaa , J. Zakrzewska , A. M. Wrobel, J. Balcerzak, J. Tyczkowski, Surface modification of silicon oxycarbide films produced by remote hydrogen microwave plasma chemical vapour deposition from tetramethyldisiloxane precursor, Surf. Coat. Technol. 2018, 350, 686-698.
M. Wrobel,* P. Uznanski, Hard silicon carbonitride thin-film coatings produced by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 1: Deposition mechanism, chemical structure, and surface morphology, Plasma Process. Polym., 2021, 18 (5), 1-19, e2000240.
M. Wrobel,* P. Uznanski, Hard silicon carbonitride thin‐film coatings by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 2: Physical, optical, and mechanical properties of deposited films, Plasma Process. Polym., 2021, 18 (4), 1-15, e2000241.
M. Wrobel,* .P. Uznanski, Amorphous silicon carbonitride a‐SiCN thin film coatings by remote plasma chemical vapor deposition using organosilicon precursor: Effect of plasma composition, Plasma Process. Polym., 2023, 20 (3), 1-15, e2200154.
M. Wrobel,* P. Uznanski, Amorphous silicon carbonitride (a‐SiCN) thin film coatings by remote plasma chemical vapor deposition using organosilicon precursor: Effect of substrate temperature, Plasma Process. Polym., 2023, 20 (4), 1-19, e2200190.
