Scientific career:

1969 PhD degree in technical science, Technical University of Lodz

1972 Postdoctoral stay at the University of Liverpool in the group of Prof. C. H. Bamford

1972 Centre of Molex`cular and Macromolecular Studies, Department of Polymer Physics headed by Prof. M. Kryszewski

1977-1978 Fellow at Ecole Polytechnique of Montreal

1985 Habilitation in chemistry (formation of thin films by low-temperature plasma
polymerization of organosilicon compounds), Technical University of Lodz.
Then he developed the remote plasma chemical vapor deposition process for
the formation of high quality silicon-based thin films

1986-1987 Visiting professor at Ecole Polytechnique of Montreal

1989, 1990 Visiting professor at Tubingen University

2001 Title of Professor in chemistry

2002 Professor position at Centre of Molecular and Macromolecular Studies

2009- Professor emeritus

Member of editorial boards

1992-1998 Journal of Chemical Chemical Vapor Deposition (Technomic Publishing)

1998-2004 Plasmas and Polymers (Kluwer Academic-Plenum Publishers)

1999-2002 Journal of Wide Bandgap Materials (Sage Publications)

2004-2006 Plasma Processes and Polymers (Wiley-VCH)

2009-2012 International Journal of Biomedical Engineering and Consumer Health

Informatics (Ser. Publications)

2004-2015 Chemical Vapor Deposition (Wiley-VCH)

2015-2020 Advanced Materials Interfaces (Wiley-VCH)

2009- Applied Organometallic Chemistry (Wiley)

Research area:

Formation of amorphous silicon-based superhard and high wear resistance thin-film
materials, such as: silicon carbide, a-SiC:H, and silicon carbonitride, a-SiNC:H, by the
remote plasma chemical vapor deposition technique from organosilicon single-source
precursors. Kinetics and chemistry of film formation process. Morphological and chemical
structure of the deposited films. Mechanical and optical properties of the films. Film
structure – property relationships

Selected recent articles

A. M. Wrobel*, P. Uznanski, A. Walkiewicz-Pietrzykowska, B. Glebocki, .E. Bryszewska,
Silicon Oxycarbide Thin Films by Remote Microwave Hydrogen Plasma CVD Using a
Tetramethyldisiloxane Precursor, Chem. Vap. Deposition 2015, 21, 88–93

A. M. Wrobel*, P. Uznanski, and A. Walkiewicz-Pietrzykowska, Silicon Oxycarbide Films
Produced by Remote Microwave Hydrogen Plasma CVD using a Tetramethyldisiloxane
Precursor: Growth Kinetics, Structure, Surface Morphology, and Properties, Chem. Vap.
Deposition 2015, 21, 307–318

A. Walkiewicz-Pietrzykowska, P. Uznanski*, A. M. Wrobel, Silicon Carbide, Silicon
Carbonitride, and Silicon Oxycarbide Thin Films Formed by Remote Hydrogen Microwave
Plasma CVD, Current Organic Chemistry, 2017, 21, 1-11

A.M. Wrobel,* P. Uznanski, A. Walkiewicz‐Pietrzykowska, K. Jankowski, Amorphous
silicon carbonitride thin‐film coatings produced by remote nitrogen microwave plasma
chemical vapour deposition using organosilicon precursor, Appl. Organometal. Chem.
2017, 31, e3871

P. Uznanski, B. Glebocki , A. Walkiewicz-Pietrzykowskaa , J. Zakrzewskaa , A. M. Wrobel,
J. Balcerzak, J. Tyczkowski, Surface modification of silicon oxycarbide films produced by
remote hydrogen microwave plasma chemical vapour deposition from
tetramethyldisiloxane precursor, Surf. Coat. Technol. 2018, 350, 686-698

A. M. Wrobel,* P. Uznanski, Hard silicon carbonitride thin-film coatings produced by
remote hydrogen plasma chemical vapor deposition using aminosilane and silazane
precursors. 1: Deposition mechanism, chemical structure, and surface morphology,
Plasma Process. Polym., 2021, 18 (5), 1-19, e2000240

A. M. Wrobel,* P. Uznanski, Hard silicon carbonitride thin‐film coatings by remote
hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 2:
Physical, optical, and mechanical properties of deposited films, Plasma Process. Polym.,
2021, 18 (4), 1-15, e2000241

A. M. Wrobel,* .P. Uznanski, Amorphous silicon carbonitride a‐SiCN thin film coatings by
remote plasma chemical vapor deposition using organosilicon precursor: Effect of plasma
composition, Plasma Process. Polym., 2023, 20 (3), 1-15, e2200154

A. M. Wrobel,* P. Uznanski, Amorphous silicon carbonitride (a‐SiCN) thin film coatings by
remote plasma chemical vapor deposition using organosilicon precursor: Effect of
substrate temperature, Plasma Process. Polym., 2023, 20 (4), 1-19, e2200190