prof. dr hab. inż. Aleksander Wróbel

Email:

Affiliation:
Professor emeritus of the Centre of Molecular and Macromolecular Studies

Scientific career:

• 1969 – PhD degree in technical science, Technical University of Lodz
• 1972 – Postdoctoral fellow at the University of Liverpool in the group of Prof. C. H. Bamford (FRS)
• 1973 – Centre of Molecular and Macromolecular Studies, Department of Polymer Physics headed by Prof. M. Kryszewski
• 1977-1978 – Fellow at Ecole Polytechnique of Montreal
• 1985 – Habilitation in chemistry (Formation of thin films by low-temperature plasma polymerization of organosilicon compounds), Technical University of Lodz. Then he developed the remote plasma chemical vapor deposition process for the formation of high quality silicon-based thin films
• 1986-1987 – Visiting professor at Ecole Polytechnique of Montreal
• 1989, 1990 – Invited fellow at Tubingen University
• 1992-1993 and 1996 – Visiting professor at Shizuoka University
• 2001 – Title of Professor in chemistry

Member of editorial boards:

• 1992-1998 – Journal of Chemical Chemical Vapor Deposition (Technomic Publishing)
• 1998-2004 – Plasmas and Polymers (Kluwer Academic-Plenum Publishers)
• 1999-2002 – Journal of Wide Bandgap Materials (Sage Publications)
• 2004-2006 – Plasma Processes and Polymers (Wiley-VCH)
• 2009-2012 – International Journal of Biomedical Engineering and Consumer Health Informatics (Ser. Publications)
• 2004-2015 – Chemical Vapor Deposition (Wiley-VCH)
• 2016-2020 – Advanced Materials Interfaces (Wiley-VCH)
• 2009-          –  Organometallic Chemistry (Wiley)

Awards:

• 1979 and 1983 – Team-awards of the Secretary of Polish Academy of Science

Research areas:

• Formation of amorphous silicon-based superhard and high wear resistance thin-film materials, such as: silicon carbide a-SiC:H and silicon carbonitride a-SiCN:H, and silicon oxycarbide a-SiCO:H by remote plasma chemical vapor deposition (CVD) methods using organosilicon compounds as single-source precursors.
• Kinetics and chemistry of film formation process.
• Morphological and chemical structure of the deposited films.
• Mechanical and optical properties of the films.
• Film structure – property relationships.

Selected references:

1. A. M. Wrobel, P.Uznanski, A. Walkiewicz-Pietrzykowska, B. Glebocki, E. Bryszewska
   Silicon oxycarbide thin films by remote microwave hydrogen plasma CVD using a
   tetramethyldisiloxane precursor
   Chem. Vap. Deposition, 2015, 21, 88–93.
2. A. M. Wrobel, P. Uznanski, A. Walkiewicz-Pietrzykowska,
   Silicon oxycarbide films produced by remote microwave hydrogen plasma CVD using a
   tetramethyldisiloxane precursor: Growth kinetics, structure, surface morphology,
   and properties
   Chem. Vap. Deposition, 2015, 21, 307–318.
3. A. Walkiewicz-Pietrzykowska, P. Uznanski*, A. M. Wrobel
   Silicon Carbide, Silicon Carbonitride, and Silicon Oxycarbide Thin Films Formed by
   Remote Hydrogen Microwave Plasma CVD
   Current Organic Chemistry, 2017, 21, 1-11.
4. A.M. Wrobel,* P. Uznanski, A. Walkiewicz‐Pietrzykowska, K. Jankowski
   Amorphous silicon carbonitride thin‐film coatings produced by remote nitrogen microwave
   plasma chemical vapour deposition using organosilicon precursor
   Appl. Organometal. Chem. 2017, 31, e3871.
5. P. Uznanski, B. Glebocki , A. Walkiewicz-Pietrzykowskaa , J. Zakrzewskaa , A.r M.
   Wrobel, J. Balcerzak, J. Tyczkowski
   Surface modification of silicon oxycarbide films produced by remote hydrogen microwave
   plasma chemical vapour deposition from tetramethyldisiloxane precursor
   Surf. Coat. Technol. 2018, 350, 686-698.
6. A. M. Wrobel,* P. Uznanski
   Hard silicon carbonitride thin-film coatings produced by remote hydrogen plasma chemical
   vapor deposition using aminosilane and silazane precursors. 1: Deposition mechanism,
   chemical structure, and surface morphology
   Plasma Process. Polym. 2021, e2000240
7. A. M. Wrobel,* P. Uznanski
   Hard silicon carbonitride thin‐film coatings by remote hydrogen plasma chemical vapor
   deposition using aminosilane and silazane precursors. 2: Physical, optical, and mechanical
   properties of deposited films
   Plasma Process. Polym. 2021, e2000241
8. A. M. Wrobel,* .P. Uznanski
   Amorphous silicon carbonitride a‐SiCN thin film coatings by remote plasma chemical vapor
   deposition using organosilicon precursor: Effect of plasma composition
   Plasma Process. Polym. 2022, e2200154
9. A. M. Wrobel,* P. UznanskiAmorphous silicon carbonitride (a‐SiCN) thin film coatings by remote plasma chemical
   vapor deposition using organosilicon precursor: Effect of substrate temperature, Plasma
   Process. Polym. 2022; e2200190

Over 300 printed contributions, including 8 monographs and textbooks, 15 chapters in books and monographs. 230 citations in 2004 (total citations: over ten thousand).